320 Martin Avenue Suite C Santa Clara, CA 95050, USA
(408) 327-0285
ALD & CVD Systems
Combine High-Speed ALD and CVD in One Chamber
Cutting-Edge ALD and Breakthrough CVD with Minimal Footprint and Low Capital Expenditure
Unlike any other deposition system on the market, Atomic Precision's ALD/CVD system is:
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Compact – Minimized reactor volume for low gas residence time and faster gas exchange
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Efficient – Shortest gas path length and gas flow stability for low pulse width
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Versatile – Easily switch reactants in-situ
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Safe – Generate hazardous reactants in-situ to reduce HazMat storage
And unlike any other system on the market, Atomic Precision offers ALD and CVD in one chamber, enabled via software switch.
Our ALD/CVD technology can be applied to a variety of novel applications including:
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microelectronics,
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compound semiconductors,
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metallization,
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flexible displays
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lithium ion batteries
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cutting tool coatings
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and more
Atomic Precision is looking for technology development partners to bring ALD/CVD to the world market.
Interested?
